ESPACER™ is an aqueous solution without any organic solvent. It’s a weak acidic solution, which is applicable for both type of resist.

A thin film of ESPACER™ is highly conductive, therefore it solves problems related to positional errors during electron-beam (EB) lithography processes.

ESPACER™ 300Z is a Charge Dissipating Agent for Electron Beam Lithography (E-Beam) for positive tone Electron Beam Resists (e.g: ZEP520A PMMA).

• Used as a film for Electrification Dissipating Material this contains the original conducting polymer.
• The thin film of ESPACER™ has a high conductivity; therefore, it solves the problem about the positional error on the electron-beam (EB) lithography process
• Excellent charge dissipating effect with sheet resistance 7 x 105 ohm/sq at 20 nm thickness and conductivity of 0.7 S/cm.
• No adverse effect on resolution of resists.
• Can be applied not only onto conventional resists but also onto chemically amplified resists.
• There are cases where it can protect the resist as an acidic polymer film.
• The spun film has sufficient heat resistance in practical uses
• Water alone is used as solvent.
• It has neither a flash point, nor an ignition point, nor flammable limits
• Easily removed with water after exposure

	Non Chemical Amplified			Chemical Amplified
	Positive Resist	Positive Resist	Negative Resist	Positive Resist	Negative Resist	Negative Resist
Espacer	ZEP520	PMMA	FOC-1X	FEP-71	SAL601	NEB22
300Z
300HX02
300AX01

Resonac Asia Pacific Pte. Ltd. is the sole distributor of ESPACER™ for South East Asia, Oceania.
MOQ: 100g